Reproduce “Realistic mask generation for matter-wave lithography via machine learning” on OpenResearch

Turn your favorite coding agents into research agents that review literature, develop hypotheses, and run experiments.

Universal app for Apple silicon and Intel. Requires macOS 11 or later.

About this paper

Johannes Fiedler, Adrià Salvador Palau, Eivind Kristen Osestad, Pekka Parviainen, Bodil Holst

Tip: change arxiv.org to autoarxiv.org in any arXiv abstract link to open the paper here.