Reproduce “Suppressing DC Drift in Thin-Film Lithium Niobate Modulators via Multiferroic Skyrmion Excitation” on OpenResearch
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About this paper
Yalong Yu, Yekai Ren, Nuo Chen, Tao Chu
This paper demonstrates a method to suppress DC drift in thin-film lithium niobate (TFLN) optical modulators by exciting multiferroic skyrmions through magnetic annealing. The approach leads to near-complete DC drift elimination while preserving the critical SiO₂ cladding layer, a limitation of previous mitigation techniques.
Key insights
- Short-term (transient overshoot) and long-term (baseline shift) DC drift components share a common physical origin, exhibiting interconversion.
- Multiferroic skyrmions within lithium niobate can effectively suppress DC drift by trapping mobile charges and restricting their movement, analogous to increasing effective resistance and reducing charge accumulation.
- The ability to preserve the SiO₂ cladding layer during DC drift mitigation is crucial for device robustness and compatibility with industrial fabrication.
Summary by alphaXiv.
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